Approximation and computation for a photolithography problem
Wednesday, December 14, 2016 - 9:00am - 10:00am
The inverse photolithography problem is a key step in the production of integrated circuits. I propose a regularization and computation strategy for this optimization problem, whose key feature is a regularization procedure for a suitable thresholding operation. The validity of the method is shown by a convergence analysis and by numerical experiments. This is a joint work with Fadil Santosa (University of Minnesota) and Zhu Wang (University of South Carolina).
49Q10, 65N21, 49J45, 65K10