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Deposition Sensitivity Analysis by Using AVHRR/NOAA Global Data in Atmospheric Mesoscale Models: Preliminary Analysis

Saturday, March 18, 2000 - 3:30pm - 4:25pm
Keller 3-180
Roberto San Jose (Polytechnical University of Madrid)
Joint work with I. Salas and R.M. Gonzalez.

The importance of deposition processes is out of question on air quality mesoscale modelling studies. In this contribution we focus on using different canopy resistance parameterizations for understanding and interpreting the dry deposition processes. The different canopy reistance parameterizations from Erisman (1994) - from field experiments - and Nemani and Tunning (1989) - from satellite data - are compared and also the scenario no canopy resistance is study. The results show a critical dependence of the canopy resistance parameterization for the different air quality concentration maps. We use the OPANA model - Operational Atmospheric Numerical Pollution Model for urban and regional Areas - which is composed by a non-hydrostatic mesoscale model - based on the MEMO model (Karlsruhe University, 1994) and the MM5 model (PSU/NCAR) and the Chemical module based on the SMVGEAR method (Los Angeles University, 1994). The OPANA model is applied over the Madrid domain (80 x 100 km) with 5 km spatial resolution.