Introduction of a new process tool into semiconductor manufacturing typically involves an enormous investment in engineering time. Optimization of the selection, utilization and performance of a new kind of tool can sometimes be considerably facilitated with modeling. However, the goal of interest is often a feature or material with properties measured at the micrometer scale or below, while controls for the process may be available only on the meter scale. Spanning this gap is a significant challenge. This introductory talk will discuss some specific cases and a few of the methods that have been used to address pieces of the problem.

Material from talk    pdf (643KB)    powerpoint (1MB)
additional slide1 (gif)   additional slide2 (gif)

Back to Workshop Schedule

Back to Reactive Flow and Transport Phenomena