Leo, Dan Meiron (Caltech) and Tom Tsakalakos (Rutgers)
The manufacture and use of materials in the form of thin films
has spurred a great deal of study on how these systems differ
from their bulk counterparts. The importance of interfacial
and surface energies in thin film systems, as well as the development
of very small grains in the film itself, forces a critical evaluation
of the role of size scaling on the behavior of thin films. This
workshop will bring together material scientists and mathematicians
who are involved with studying thin film systems and issues
of scaling in such systems. Problems will include coating of
films and flow over films, epitaxy and interfacial energies,
stress driven instabilities, microstructure of deposited films,
and mechanical, electrical and magnetic properties of films.
The workshop will bring together experts doing experimental
work, materials and mathematical modeling.
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